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Apparatus for coating a substrate, computer system, a process for depositing multiple thin film coatings on a substrate and apparatus for coating a substrate.
Apparatus for coating a substrate, computer system, a process for depositing multiple thin film coatings on a substrate and apparatus for coating a substrate.
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机译:用于涂覆基板的设备,计算机系统,用于在基板上沉积多个薄膜涂层的方法以及用于涂覆基板的设备。
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摘要
A machine for covering a substrate by means of both cathodic arc plasma deposition (CAPD) and magnetron sputtering without breaking vacuum in a single chamber. A computer system monitors and controls all coating process parameters to coat in any sequence multiple thin film layers using either the CAPD or magnetron sputtering process. A rotating substrate table used in conjunction with internal and external targets coats both sides of the substrate simultaneously.
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