CORE-SHELL TYPE STRUCTURE FORMATION METHOD CAPABLE OF SECURING THE MASS PRODUCTION OF A CORE SHELL STRUCTURE AND A TRANSISTOR MANUFACTURING METHOD USING THE SAME

摘要

PURPOSE: A core-shell type structure formation method and a transistor manufacturing method using the same are provided to form a core shell structure into a desired form and at a desired place using a top down mode semiconductor manufacturing process.;CONSTITUTION: An area in which a core-shell structure is formed on a substrate is appointed. A groove(26) is formed on the substrate. A first shell layer(28) covers the surface of the groove and is formed on the substrate. A core(34) is formed on the groove. A second shell layer(36), which covers the core, is formed.;COPYRIGHT KIPO 2010