首页> 外国专利> THIN FILM TRANSISTOR ARRAY SUBSTRATE WITH A SUPERIOR LIFT OFF MARGIN AND A METHOD FOR MANUFACTURING THE SAME

THIN FILM TRANSISTOR ARRAY SUBSTRATE WITH A SUPERIOR LIFT OFF MARGIN AND A METHOD FOR MANUFACTURING THE SAME

机译:具有超高边距的薄膜晶体管阵列基板及其制造方法

摘要

PURPOSE: A thin film transistor array substrate and a method for manufacturing the same are provided to obtain undercut of a sufficient width in a lower part of a photoresist pattern.;CONSTITUTION: A gate wire includes a gate line formed on an insulating substrate(10) and a gate electrode(24). A gate insulating layer(30) covers the gate wire. A semiconductor layer(44) is formed on the gate insulating layer. A data wire includes a data line, a source electrode(65), and a drain electrode(66) formed on the semiconductor layer. The first protective film(70) exposes a part of the drain electrode. The outer sidewall of the second protective film(80) is located in the inner side of the outer sidewall of the first protective film.;COPYRIGHT KIPO 2010
机译:目的:提供一种薄膜晶体管阵列基板及其制造方法,以在光致抗蚀剂图案的下部获得足够宽度的底切;组成:栅极线包括形成在绝缘基板上的栅极线(10) )和栅电极(24)。栅极绝缘层(30)覆盖栅极线。在栅极绝缘层上形成半导体层(44)。数据线包括形成在半导体层上的数据线,源电极(65)和漏电极(66)。第一保护膜(70)使漏电极的一部分露出。第二保护膜(80)的外侧壁位于第一保护膜的外侧壁的内侧。; COPYRIGHT KIPO 2010

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号