首页> 外文会议>IMAPS/ACERS International Conference and Exhibition on Ceramic Interconnect and Ceramic Microsystems Technologies >Combined Manufacture Methods for high density LTCC-substrates: thick film screen-printing, ink-jet, post-firing thin film processes and laser-drilled fine-vias
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Combined Manufacture Methods for high density LTCC-substrates: thick film screen-printing, ink-jet, post-firing thin film processes and laser-drilled fine-vias

机译:高密度LTCC - 基材的组合制造方法:厚膜丝网印刷,喷墨,发射后薄膜工艺和激光钻孔细孔

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This paper highlights the possible combination of technologies like thick film screen-printing, ink-jet, and post-firing thin film processes in conjunction with laser-drilled fine-vias to produce high-density, miniaturized LTCC substrates. To obtain the silver pattern on the inner layers, both conventional thick film printing and ink-jet printing (using nano-silver particle dispersed ink) were applied on the ceramic green sheets. The ink-jet process made it possible to metallize fine lines with line / space = 30 / 30 μm. For inter-layer connections, fine-vias of 30 μm in diameter formed by UV laser was used. Then, these sheets were stacked on top of each other and fired to obtain a base substrate. On this base substrate, fine copper patterns for flip chip mounting were formed by a thin film process. The surface finish consisted of a nickel passivation and a gold layer deposited by electroless plating. The combination of the three patterning processes for conducting traces and UV laser drilling of fine-vias make it appear possible to realize fine pitch LTCC, e.g. for flip chip device mounting.
机译:本文突出了厚膜丝网印刷,喷墨和燃烧后薄膜工艺等技术的组合,与激光钻孔的细孔一起产生高密度,小型化LTCC基板。为了获得内层上的银色图案,将常规的厚膜印刷和喷墨印刷(使用纳米银颗粒分散油墨)施加在陶瓷生片上。喷墨工艺使得可以使用线/空间= 30 /30μm的细线金属化细线。对于层间连接,使用由UV激光形成的直径为30μm的细孔。然后,这些片材彼此顶部堆叠并烧制以获得基础基材。在该基础基板上,通过薄膜工艺形成用于倒装芯片安装的细铜图案。表面饰面包括镍钝化和沉积的金层,沉积镀层。用于导电迹线的三个图案化方法的组合和细孔的uV激光钻孔使得可以实现精细音高LTCC,例如,可以实现细小音高LTCC。用于倒装芯片装置安装。

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