ACID TRANSFER COMPOSITION CONTAINING A RADIATION SENSITIVE ACID GENERATOR, A POLYMER HAVING A FUNCTIONAL GROUP WITH NITROGEN, AND A KETONE-BASED SOLVENT, AN ACID TRANSFER FILM USING THE SAME, AND A METHOD FOR FORMING A PATTERN USING THE SAME

摘要

PURPOSE: An acid transfer composition, an acid transfer film using the same, and a method for forming a patter are provided to form the pattern thorough a conventional lithography process without containing an acid generator on a resin film in which the pattern is formed.;CONSTITUTION: An acid transfer composition contains a radiation sensitive acid generator, a polymer having a functional group with nitrogen, and a ketone-based solvent. The polymer contains a polymer having a structural unit which is marked by chemical formula 1. In chemical formula 1, R1 is hydrogen or a methyl group. R2 and R3 are hydrogen, a linear or branched hydrocarbon group having a carbon number of 1-10, and a cyclic hydrocarbon group having a carbon number of 3-10. The radiation sensitive acid generator is a compound having an imide-sulfonate group.;COPYRIGHT KIPO 2010