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AUTO-FOCUS CALIBRATION METHOD OF THE PHOTOMASK ESTABLISHING THE FOCUS VALUE FOR THE PHOTOMASK INSPECTION

机译:建立光掩模检查的聚焦值的光掩模的自动聚焦校准方法

摘要

PURPOSE: The auto-focus calibration method of photomask is proceed the calibration for the inspection point of the back sight pattern. The focus value for the photomask inspection is instituted.;CONSTITUTION: It is subjected in the frame area of photomask(100) having the main chip area(110) and frame area(120) the focus calibration. The back sight pattern(130) is formed. The calibration is proceed for the inspection point of the back sight pattern and the focus value for the photomask inspection is instituted. The back sight pattern is formed including the light-shielding layer or the phase shift layer.;COPYRIGHT KIPO 2011
机译:目的:光罩的自动聚焦校准方法是对后视图案的检查点进行校准。建立用于光掩模检查的焦点值。组成:在具有主芯片区域(110)和框架区域(120)的光掩模(100)的框架区域中进行焦点校准。形成后视图案(130)。对后视图案的检查点进行校准,并确定用于光掩模检查的焦点值。形成包括遮光层或相移层的后视图案。; COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20100101828A

    专利类型

  • 公开/公告日2010-09-20

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20090020230

  • 发明设计人 OH SUNG HYUN;

    申请日2009-03-10

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 18:31:55

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