CHEMICAL VAPOR DEPOSITION APPARATUS CAPABLE OF SMOOTHLY DISCHARGING EXHAUST GAS FROM THE CHAMBER AND PREVENTING THE INFLOW OF WASTE GAS INTO THE CHAMBER

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to smoothly discharge exhaust gas from the chamber and prevent the inflow of waste gas into the chamber, thereby reliability of operation.;CONSTITUTION: A chemical vapor deposition apparatus comprises a chamber(10), a hole cylinder(32) and a movable cap(40). The hole cylinder with a hole is formed in the chamber to pass the gas flowing in the chamber. The hole of the cylinder is formed perpendicularly to a vent formed in the center of the chamber and connected to the vent. The movable cap selectively opens the hole according to the flow direction of the gas.;COPYRIGHT KIPO 2011