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APPARATUS FOR GENERATING HIGH DENSITY PLASMA, CAPABLE OF SECURING THE SUPERIOR GAP-FILLING CHARACTERISTIC WITHOUT THE INCREASE OF A PROCESSING TIME
APPARATUS FOR GENERATING HIGH DENSITY PLASMA, CAPABLE OF SECURING THE SUPERIOR GAP-FILLING CHARACTERISTIC WITHOUT THE INCREASE OF A PROCESSING TIME
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机译:用于产生高密度等离子体的装置,该装置能够在不增加处理时间的情况下确保较高的间隙填充特性
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摘要
PURPOSE: An apparatus for generating high density plasma is provided to form a magnetic mirror in a chamber by inserting a mirror coil into an inductively coupled plasma type high density plasma machine.;CONSTITUTION: An apparatus for generating high density plasma includes a chamber(200), coils(210, 212), and an electrostatic chuck. The chamber is a dome shape and provides a space for generating plasma. The electrostatic chuck is located on the center of the chamber. A plurality of gas spraying injectors sprays a source gas to the upper side of a semiconductor substrate which is loaded on the electrostatic chuck.;COPYRIGHT KIPO 2011
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