PLASMA GENERATING APPARATUS CAPABLE OF EFFICIENTLY GENERATING HIGH DENSITY PLASMA BY MAXIMALLY REDUCING THE LOSS OF A MICROWAVE, A PLASMA PROCESSING APPARATUS, AND A PLASMA PROCESSING METHOD

摘要

PURPOSE: A plasma generating apparatus, a plasma processing apparatus, and a plasma processing method are provided to maximally control energy loss by performing plasma processing for a processed object.;CONSTITUTION: A microwave generating unit(21) generates a microwave. A hollow shaped rectangular waveguide(22) is connected to the microwave generating unit. A gas supply unit(23) is connected to the rectangular waveguide. The gas supply unit supplies a process gas to the inside. An antenna unit(40) is corresponded to one part of the rectangular waveguide. The antenna unit emits the plasma generated in the inside to the outside. The antenna unit has one or a plurality of slot holes(41) formed in a wall of a short side. The process gas provided within the rectangular waveguide in an atmosphere pressure state becomes like plasma by the microwave.;COPYRIGHT KIPO 2012