PROBLEM TO BE SOLVED: To provide a plasma generation apparatus, a plasma processing apparatus, a plasma generation method and a plasma processing method, that can generate a plasma of large area and uniform plasma density even when processing pressure is high.;SOLUTION: The plasma generation apparatus includes a processing container, a gas supply section which supplies a process gas into the processing container, a transmission window occupying a part of a wall surface of the processing container, a microwave introduction section which introduces a microwave into the transmission window, and a first high-density plasma generation section which has a plurality of hole portions penetrating in a thickness direction and is provided in the processing container while isolated from the transmission window, wherein the first high-density plasma generation section generates a plasma by a hollow discharge at the first hole portions.;COPYRIGHT: (C)2011,JPO&INPIT
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