A mask for micro lens fabrication of CMOS image sensor and a method for fabrication of micro lens by using the mask.

摘要

A mask for forming a microlens of a CMOS image sensor and a method for forming the microlens using the same are provided to control an interval of the pattern for forming the microlens minutely by giving different light energy according to the height difference between structures formed on a wafer in which an exposure process is performed. The transmittance of a pattern region formed in a region to form a microlens is lower than the transmittance of the pattern region formed in the other region(108). The other region has a structure which is higher or lower than the region to form the microlens on the wafer. A metal layer for forming a scribe lane and a metal pad is formed in the other region. A photoresist layer is coated on the wafer. The exposure process is performed by using the mask.