CONTROLLING METHOD FOR PATTERN FORMING IN LITHOGRAPHY USING ATOMIC FORCE MICROSCOPE

摘要

A pattern formation control method at a lithography using an AFM is provided to form a lithography pattern with specific height and width although speed of the stage is changed. A pattern formation control method at a lithography using an AFM comprises a step of setting up the change rate of the stage drive voltage(VS) to be relatively lower at a peak and a lowest point of the stage drive voltage. The stage drive voltage is used when the stage is moved to a AFM probe or the or the AFM probe is moved to a substrate. The stage is mounted on the substrate in order to form the lithographic pattern. A waveform(10) of a stage drive voltage is the sinusoidal wave.