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METHOD growing single crystals GERMANY diameter of 6 INCHES BY OTF

机译:方法通过OTF生长直径为6英寸的德国单晶

摘要

FIELD: physics.;SUBSTANCE: invention relates to growing doped germanium monocrystals in a temperature gradient using a heating element immersed in a melt under conditions of an axial heat flow near a crystallisation front (OTF method). The doped germanium monocrystals are grown from a melt in a crucible placed on a heat-removing unit to an crystallographically directed innculant with diametre equal to the inner diametre of the crucible, under conditions of axial heat flow near the crystallisation front - OTF method, using a multi-section background heater and a multi-section immersed in the melt - OTF-heater kept at constant temperature T1 by moving the crucible with the inoculant and growing crystal into the cold zone of the furnace relative the OTF-heater, with different initial concentrations of doping impurities C1 in the crystallisation zone W1 with height of the melt h, and C2 in a replenishment zone W2, and with reduction of temperature of the bottom of the crucible T4(t) when moving, in accordance with the law: T4(t)=T40 -a×t, where T40 is initial temperature value, a=v(λm×gradTp+Q)/λcr, v is drawing rate of the crystal, λm is thermal conductivity of molten germanium, gradTp is axial temperature gradient in the melt in which the crystal is grown, Q is crystallisation heat, λcr is thermal conductivity of the germanium crystal. Mass transfer of the melt is controlled in the crystallisation zone by selecting optimum ratio between axial temperature gradient in the melt gradTp, radial distribution of temperature along the OTF-heater, height of the layer of the melt h and drawing rate v. Germanium monocrystals are grown in crystallographic dirctions [111] and [100] depending on diametre of the crystal and required quality given the following parameters: h=5-30 mm, gradTp=3-50°C/cm, v=2-30 mm/h, temperature difference of the OTF-heater T2-T1=0-6°C, temperature difference between the lateral surface of the crucible T3 and temperature of the OTF-heater T2, equal to T3-T2=1-20°C.;EFFECT: obtaining germanium monocrystals with diametre of up to 150 mm without growth region with high cross sectional macro-uniformity of distribution of resistance of 5-10%.;10 cl, 1 ex, 2 dwg
机译:技术领域本发明涉及使用浸没在熔体中的加热元件在接近结晶前沿的轴向热流条件下(OTF方法)在温度梯度中生长掺杂的锗单晶。掺杂的锗单晶是在靠近结晶前沿-OTF方法的条件下,从位于排热装置上的坩埚中的熔体生长到直径等于坩埚内径的结晶学导向的孕育剂,使用通过将坩埚和孕育剂一起移动并使晶体生长到相对于炉子的冷区中,将多段式背景加热器和多段式浸入熔体中的OTF加热器保持在恒定温度T 1 OTF加热器,在结晶区W 1 中初始掺杂浓度为C 1 ,熔体高度为h,C 2 不同>在补给区W 2 中,并且移动时坩埚T 4 (t)的底部温度降低,这符合法律:T 4 (t)= T 4 0 -a×t,其中T 4 0 是初始温度值,a = v(λ m ×grad Tp + Q)/λ cr ,v是晶体的拉伸速率,λ m 是熔融锗的导热系数,gradTp是熔体中的轴向温度梯度,其中晶体生长,Q是结晶热,λ cr 是锗晶体的热导率。通过在熔体梯度Tp中的轴向温度梯度,沿OTF加热器的温度径向分布,熔体层的高度h和拉伸速率v之间选择最佳比率,可以控制结晶区中熔体的传质。在以下参数下,根据晶体的直径和所需质量,以晶体学方向[111]和[100]生长:h = 5-30 mm,gradTp = 3-50°C / cm,v = 2-30 mm / h ,OTF加热器T 2 -T 1 = 0-6°C的温度,坩埚T 3侧面之间的温差和温度T 2 等于T 3 -T 2 = 1-20°C;效果:获得直径最大为150 mm的无生长区域的锗单晶,电阻分布的高横截面宏观均匀性为5-10%.; 10 cl,1 ex,2 dwg

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