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METHOD OF MAKING THIN FILMS CONTAINING NANOSTRUCTURED TIN DIOXIDE
METHOD OF MAKING THIN FILMS CONTAINING NANOSTRUCTURED TIN DIOXIDE
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机译:制备包含纳米结构二氧化锡的薄膜的方法
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摘要
FIELD: physics; nanotechnology.;SUBSTANCE: invention relates to nanotechnology and can be used for making sensors, devices for monitoring composition of gas mixtures, optical devices, in optoelectronics and nanoelectronics. In the method of making thin films which contain nanostructured tin dioxide, pores in cells of nanostructured aluminium oxide are filled with tin metal, after which tin is oxidised in air at 250-450°C for 40-90 minutes.;EFFECT: obtaining uniformly ordered tin dioxide structures.;1 ex
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机译:领域:物理学;发明领域:本发明涉及纳米技术,并且可以用于制造光电子学和纳米电子学中的传感器,用于监测气体混合物的成分的装置,光学装置。在制备包含纳米结构二氧化锡的薄膜的方法中,用锡金属填充纳米结构氧化铝的小室中的孔,然后锡在250-450°C的空气中氧化40-90分钟;效果:均匀地获得有序的二氧化锡结构。; 1 ex
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