Porous silica precursor composition and method for preparing the precursor composition, porous silica film, and methods for producing the porous silica film, semiconductor element, image display apparatus, and liquid crystal display

摘要

A porous silica precursor composition is herein provided and the precursor composition comprises an organic silane represented by the following chemical formula 1: R1m(R2-O)4-mSi (in the formula, R1 and R2 may be the same or different and each represent an alkyl group, and m is an integer ranging from 0 to 3); water; an alcohol; and a quaternary ammonium compound represented by the following chemical formula 2: R3N(R4)3X (in the formula, R3 and R4 may be the same or different and each represent an alkyl group and X represents a halogen atom). The composition is prepared by a method comprising the step of blending the foregoing components. The porous silica precursor composition is coated on a substrate and then fired to thus form a porous silica film. Also disclosed herein include a semiconductor element, an apparatus for displaying an image and a liquid crystal display, each having the foregoing porous silica film.