Illumination lens for microlithography-projection exposure system, has optical element or additional optical element designed such that illumination light-beam angle distribution is influenced at object at two planes

摘要

The illumination lens (2) has an optical element (8) for producing a predetermined illumination light-beam angle distribution of a used radiation bundle at a place of an object (4) to be projected. The optical element or an additional optical element are designed such that the illumination light-beam angle distribution is influenced at the object at two planes, which are standing perpendicular on one another, in different measures by displacement of the optical element or the additional optical element. Independent claims are also included for the following: (1) a projection exposure system comprising an illumination lens (2) a method for manufacturing a micro-structured component.