Lighting system for microlithographic-projection exposure system for illuminating object field in object level with illumination radiation, has two mirrors, where one mirror is flat mirror

摘要

The lighting system has two mirrors (5,7) where one of the mirrors is a flat mirror. Both the mirrors are operated under grazing incidence. The aperture of the illumination radiation at an object field (1) is greater than 0.05. A ray strikes on the former mirror under an incidence angle during operation of the microlithographic-projection exposure system. The incidence angle is larger than the incidence angle of another ray on the former mirror. The former ray strikes on the latter mirror under an incidence angle which is smaller than the incidence angle of the latter ray on the latter mirror.