Method for operating microlithographic projection lighting apparatus, involves arranging mask in object plane of projection objective, where lighting setting, adjusted in lighting device, is changed dynamically

摘要

The method involves arranging a mask (30) in an object plane of a projection objective (20), where the mask includes imaging patterns. The lighting setting, adjusted in a lighting device (10), is changed dynamically during the operation of a projection lighting apparatus. A dependence of the structural width caused by temporal varying effects is reduced from the vicinity of the imaging patterns by the change of the lighting setting.