The optical system is a projection objective or lighting device of a microlithographic projection exposure apparatus, especially

摘要

Being relatively soft vis-a-vis polarized light state, it offers the optical system which can exert quick influence. As for this invention, the optical system which includes the manipulator (150, 250, 722, 851 - 854, 951a - 954a, 951b - 954b) which can produce the polarized light compensator (100, 200, 300, 400, 800 and 900), and which at least possesses one polarized light correction part element (110 - 140, 210 - 240, 310 - 340, 410 - 440, 810 - 840, 910 - 940) to modify the position of this at least one part element, especially, in regard to the illumination device and projection objective appliance of the micro lithography projection exposure device, in the optical system, the optical axis (OA)Belonging to vertical plane surface vis-a-vis, the strength which covers the territory where it is possible to illuminate making use of the light from the illuminant, it is possible at least to set one which does not exceed 20% of the maximum strength in this plane surface operation mode (501 - 504) the manipulator (150, 250, 722, 851 - 854, 951a - 954a, 951b - 954b) is arranged in this territory. Selective figure Figure 1b