Projection objective for microlithographic projection exposure apparatus, has optical subsystem that projects intermediate image into image-plane with image-plane side projection ratio of specific value

摘要

The objective (100) produces an intermediate image (IMI) and comprises an optical subsystem (130) on an image-plane side that projects the IMI into an image-plane (IP) with an image-plane side projection ratio. The ratio has an absolute value of 0.3. An independent claim is included for micro-structured component manufacturing method.