Lighting equipment of microlithographic projection lighting plant, used for producing microstructurized device, e.g. highly integrated circuit on silicon wafer, has mirror in objective on and parallel to optical axis

摘要

In lighting equipment of microlithographic projection lighting plant with (a) a light source, (b) an objective (20) with an object plane, exit pupil (30) and several lenses (50, 52, 54) along an optical axis (22) and (c) an optical raster element (16), which is in the object plane and determines the intensity distribution in the exit pupil, the novelty is that a mirror (58) is placed in the objective directly on and parallel to the optical axis. An independent claim is also included for a process for microlithographic production of microstructurized devices.