Low-sintered glass, useful e.g. in dental material that is useful to coat titanium substrate, comprises e.g. silicon dioxide, boron trioxide, yttrium oxide, metal oxide, aluminum oxide, titanium dioxide, tin dioxide and zirconium dioxide

摘要

Low-sintered glass comprises: silicon dioxide (0-20 wt.%); boron trioxide (4-25 wt.%); niobium pentoxide and tantalum pentoxide (0-40 wt.%); lanthanide oxide, yttrium oxide and aluminum oxide (30-55 wt.%); metal oxide (Me(II)O) (0-22 wt.%); Me(I) 2O (0-10 wt.%); and titanium dioxide, tin dioxide, zirconium dioxide and germanium dioxide (0-10 wt.%). Low-sintered glass comprises: silicon dioxide (0-20 wt.%); boron trioxide (4-25 wt.%); niobium pentoxide and tantalum pentoxide (0-40 wt.%); lanthanide oxide, yttrium oxide and aluminum oxide (30-55 wt.%); metal oxide (Me(II)O) (0-22 wt.%); Me(I) 2O (0-10 wt.%); and titanium dioxide, tin dioxide, zirconium dioxide and germanium dioxide (0-10 wt.%), where: Me(II)O is at least one of the bivalent metal oxide including magnesium oxide, calcium oxide, strontium oxide, barium oxide and zinc oxide; Me(I) 2O is at least one of monovalent metal oxide of alkali metal in which Me is lithium, sodium, potassium, rubidium or cesium; lanthanide oxide is at least one oxide of elements of 4f-lanthanide of periodic system including lanthanum, cerium or ytterbium; and the amount of aluminum oxide is 0-10 wt.%. An independent claim is included for a dental material comprising the above glass.