首页> 外国专利> Schottky diode for applying a high power and method of manufacturing

Schottky diode for applying a high power and method of manufacturing

机译:用于施加大功率的肖特基二极管及其制造方法

摘要

The invention relates to a Schottky diode that comprises a substrate (24), an active layer (21) made of a semiconducting material, a so-called Schottky contact layer (27), an ohmic contact conducting layer (25), said substrate further including at least one via-hole (28) in order to define a membrane above said via-hole, having a so-called lower face at the level of the substrate and a so-called upper face remote from the substrate, characterised in that the membrane includes at least the following stack of layers starting from said so-called lower face: the so-called Schottky contact layer; the layer of semi-conducting material; the ohmic contact layer being at the upper face of said membrane. The invention also relates to a method for making such a diode.
机译:本发明涉及一种肖特基二极管,其包括衬底(24),由半导体材料制成的有源层(21),所谓的肖特基接触层(27),欧姆接触导电层(25),所述衬底还包括至少一个通孔(28),以便在所述通孔上方限定膜,该膜具有在基板水平的所谓的下表面和远离基板的所谓的上表面,其特征在于,所述膜至少包括从所述所谓的下表面开始的以下层的堆叠:所谓的肖特基接触层;半导体材料层;欧姆接触层在所述膜的上表面。本发明还涉及一种制造这种二极管的方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号