首页> 外国专利> WAVEFRONT MEASUREMENT METHOD, WAVEFRONT MEASUREMENT DEVICE, AND MICROSCOPE

WAVEFRONT MEASUREMENT METHOD, WAVEFRONT MEASUREMENT DEVICE, AND MICROSCOPE

机译:波前测量方法,波前测量装置和显微镜

摘要

PROBLEM TO BE SOLVED: To precisely measure wavefront even if the density of a scatterer near a focal plane is low.;SOLUTION: The wavefront measurement method includes: a contrast measurement step S2 which measures contrast of the interference pattern corresponding to respective parts of a sample which is generated by interference between the return light from a focal plane within the sample containing a scatterer with reference light; a region extracting step S3 which extracts a high contrast region in which the contrast measured in the contrast measurement step S2 is equal to a predetermined threshold value or higher; and a wavefront calculation step S4 for converting the interference pattern corresponding to the high contrast region to a wavefront data about the high contrast region that has been extracted by the region extracting step S3.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:即使在焦平面附近散射体的密度较低,也要精确地测量波前;解决方案:波前测量方法包括:对比度测量步骤S2,该步骤测量与光子的各个部分相对应的干涉图案的对比度。样品,是由包含散射体的样品中焦平面的返回光与参考光之间的干涉产生的;区域提取步骤S3,提取在对比度测定步骤S2中测定的对比度为规定的阈值以上的高对比度区域。波前计算步骤S4,用于将与高对比度区域相对应的干涉图样转换为关于通过区域提取步骤S3所提取的高对比度区域的波前数据。COPYRIGHT:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2011215003A

    专利类型

  • 公开/公告日2011-10-27

    原文格式PDF

  • 申请/专利权人 OLYMPUS CORP;

    申请/专利号JP20100083476

  • 发明设计人 MURAYAMA YOSHIAKI;

    申请日2010-03-31

  • 分类号G01J9/02;G01B9/02;G02B21/06;G02B21/36;G01N21/64;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:37

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号