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Wavefront measurement method, wavefront measurement apparatus, and microscope

机译:波前测量方法,波前测量设备和显微镜

摘要

A wavefront is measured with superior precision even if the density of scatterers in the vicinity of a focal plane is low. Provided is a wavefront measurement method including a contrast measuring step of measuring the contrast of an interference pattern corresponding to each part of a specimen containing a scatterer, generated by interfering reference light and return light from a focal plane in the specimen; a region extracting step of extracting a high-contrast region in which the contrast measured in the contrast measuring step is greater than or equal to a prescribed threshold; and a wavefront calculating step of converting an interference pattern corresponding to the high-contrast region to wavefront data, for the high-contrast region extracted in the region extracting step.
机译:即使焦平面附近的散射体密度低,也能以极高的精度测量波前。本发明提供一种波阵面测量方法,该波阵面测量方法包括对比度测量步骤,该对比度测量步骤测量与包含散射体的样品的每个部分相对应的干涉图案的对比度,该干涉图案通过干涉参考光和来自样品的焦平面的返回光而产生。区域提取步骤,其提取其中在对比度测量步骤中测量的对比度大于或等于规定阈值的高对比度区域;对于在区域提取步骤中提取的高对比度区域,将与高对比度区域相对应的干涉图案转换为波阵面数据的波阵面计算步骤。

著录项

  • 公开/公告号US2011242649A1

    专利类型

  • 公开/公告日2011-10-06

    原文格式PDF

  • 申请/专利权人 YOSHIAKI MURAYAMA;

    申请/专利号US201113065502

  • 发明设计人 YOSHIAKI MURAYAMA;

    申请日2011-03-22

  • 分类号G02B21/06;G01B11/02;

  • 国家 US

  • 入库时间 2022-08-21 18:12:02

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