PLASMA GENERATION SOURCE, PLASMA GENERATOR, FILM DEPOSITION DEVICE, ETCHING DEVICE, ASHING DEVICE, AND SURFACE TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma generation source and a plasma generator, capable of stably generating uniform plasma with high density and a large area, a film deposition device utilizing the plasma generator, an etching device and an ashing device, and a surface treatment device.;SOLUTION: The capacity coupling plasma generation source with a magnetic field includes electrodes and magnets, arranged at an upper part of an insulator, and an AC power source connected to the electrodes. The electrode is made of a pair of interdigital electrodes arranged in opposition. The pair of interdigital electrodes, wherein comb tooth-shaped sections are alternately arranged in parallel with each other and the magnets are arranged among the comb tooth-shaped sections, and a plasma generation gas is turned into a plasma by an electric field from the electrodes and a magnetic field from the magnets.;COPYRIGHT: (C)2011,JPO&INPIT