RADIATION-SENSITIVE COMPOSITION FOR FORMING DIELECTRIC, DIELECTRIC, METHOD FOR FORMING DIELECTRIC, AND ELECTRONIC COMPONENT

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which has a high sensitivity to exposure light and can be baked at a low temperature and allows formation of a dielectric which has a low dielectric loss tangent and a high dielectric constant even in the case of a thin film and is superior in resolution and electric insulation.;SOLUTION: The radiation-sensitive composition for forming a dielectric contains (A) an alkali-soluble resin having a phenolic hydroxyl, (B) a radiation-sensitive acid generator, (C1) a compound having at least two alkyl-etherified amino groups in a molecule, (C2) a compound having an oxiranyl group, (D) a solvent, and (E) dielectric inorganic particles, wherein the compound (C2) is contained in amount of 50 to 200 parts by weight based on 100 parts by weight of the compound (C1).;COPYRIGHT: (C)2011,JPO&INPIT