首页> 外国专利> METHOD FOR MANUFACTURING LIGHT RECEIVING ELEMENT ARRAY AND LIGHT RECEIVING ELEMENT ARRAY, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER AND EPITAXIAL WAFER

METHOD FOR MANUFACTURING LIGHT RECEIVING ELEMENT ARRAY AND LIGHT RECEIVING ELEMENT ARRAY, AND METHOD FOR MANUFACTURING EPITAXIAL WAFER AND EPITAXIAL WAFER

机译:制造光接收元件阵列和光接收元件阵列的方法,以及制造表观晶片和表观晶片的方法

摘要

PROBLEM TO BE SOLVED: To provide a light receiving element array and a method for the manufacturing the same, which maintain the crystalline quality of an light receiving layer formed on a group III-V semiconductor substrate to obtain excellent characteristics, and which improve the crystallinity at the surface of a window layer; an epitaxial wafer used for manufacturing the light receiving element array; and a method for manufacturing the same.;SOLUTION: The method for manufacturing the light receiving element array 1 having a plurality of light receiving regions 21, includes the steps of: growing the light receiving layer 7 on an n-type InP substrate 3; growing an InP window layer on the light receiving layer 7; and diffusing a p-type impurity in regions, in the window layer 11, corresponding to the plurality of light receiving regions 21. The window layer 11 is grown by MOVPE using only metal-organic sources, at a growth temperature equal to or lower than that of the light receiving layer 7.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:提供一种光接收元件阵列及其制造方法,其保持形成在III-V族半导体衬底上的光接收层的结晶质量以获得优异的特性,并改善结晶度。在窗口层的表面;用于制造光接收元件阵列的外延晶片;解决方案:用于制造具有多个光接收区域21的光接收元件阵列1的方​​法包括以下步骤:在n型InP衬底3上生长光接收层7;以及在n型InP衬底3上生长光接收层7。在光接收层7上生长InP窗口层;并且,在与多个受光区域21相对应的窗层11中,使p型杂质扩散到各区域中。窗层11仅通过金属有机源通过MOVPE以等于或低于生长温度的生长温度生长。光接收层7的光;版权:(C)2011,JPO&INPIT

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