COMPOSITION FOR REMOVING CSD COATING FILM, METHOD FOR REMOVING CSD COATING FILM USING THE SAME, FERROELECTRIC THIN FILM, AND METHOD OF MANUFACTURING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a composition for removing a CSD solution coating film, capable of preventing generation of particles by removing a film on an outer circumferential end of a substrate without generating cracks and local peeling, and to provide a method of manufacturing a ferroelectric thin film using the same. PSOLUTION: The composition for removing a CSD coating film containing one or two types of organic solvent selected from β-diketones, β-ketoesters, polyalcoholes, carboxylic acids, alkanolamines, α-hydroxycarboxylic acid, α-hydroxycarbonyle derivative, and hydrazone derivative and water, is injected or dripped to remove the outer circumferential end of the CSD coating film. PCOPYRIGHT: (C)2011,JPO&INPIT