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FLUID FOR REMOVING COATING FILM FORMED BY CSD, METHOD FOR REMOVING CSD COATING FILM USING SAME, AND FERROELECTRIC THIN FILM AND PROCESS FOR PRODUCING SAME
FLUID FOR REMOVING COATING FILM FORMED BY CSD, METHOD FOR REMOVING CSD COATING FILM USING SAME, AND FERROELECTRIC THIN FILM AND PROCESS FOR PRODUCING SAME
A fluid for removing a coating film formed by CSD is sprayed or dropped onto the peripheral edge of a substrate to be subsequently heat-treated in a CSD method, the fluid comprising a mixture of one or more organic solvents and water in a weight ratio of 50/50 to 0/100, the organic solvents being selected from β-diketones, β-ketoesters, polyhydric alcohols, carboxylic acids, alkanolamines, α-hydroxycarboxylic acids, α-hydroxycarbonyl derivatives, and hydrazone derivatives. Thus, the coating film is partly removed without causing cracks or local peeling, and particle generation is prevented.
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