首页> 外国专利> FLUID FOR REMOVING COATING FILM FORMED BY CSD, METHOD FOR REMOVING CSD COATING FILM USING SAME, AND FERROELECTRIC THIN FILM AND PROCESS FOR PRODUCING SAME

FLUID FOR REMOVING COATING FILM FORMED BY CSD, METHOD FOR REMOVING CSD COATING FILM USING SAME, AND FERROELECTRIC THIN FILM AND PROCESS FOR PRODUCING SAME

机译:用于去除由CSD形成的涂层膜的流体,用于相同方法去除CSD涂层膜的方法以及铁电薄膜及其制造方法

摘要

A fluid for removing a coating film formed by CSD is sprayed or dropped onto the peripheral edge of a substrate to be subsequently heat-treated in a CSD method, the fluid comprising a mixture of one or more organic solvents and water in a weight ratio of 50/50 to 0/100, the organic solvents being selected from β-diketones, β-ketoesters, polyhydric alcohols, carboxylic acids, alkanolamines, α-hydroxycarboxylic acids, α-hydroxycarbonyl derivatives, and hydrazone derivatives. Thus, the coating film is partly removed without causing cracks or local peeling, and particle generation is prevented.
机译:将用于去除由CSD形成的涂膜的流体喷洒或滴落到基板的外围边缘上,随后以CSD方法进行热处理,该流体包含一种或多种重量比为1的有机溶剂和水的混合物。 50/50至0/100,有机溶剂选自β-二酮,β-酮酸酯,多元醇,羧酸,链烷醇胺,α-羟基羧酸,α-羟基羰基衍生物和衍生物。因此,部分除去了涂膜而不引起裂纹或局部剥离,并且防止了颗粒的产生。

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