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A template pattern design method, a template manufacturing method, and a semiconductor device manufacturing method.
A template pattern design method, a template manufacturing method, and a semiconductor device manufacturing method.
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机译:模板图案设计方法,模板制造方法和半导体器件制造方法。
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摘要
A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.
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