首页> 外国专利> SEMICONDUCTOR LIGHT EMITTING ELEMENT, SEMICONDUCTOR LIGHT EMITTING DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT, METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE, ILLUMINATING APPARATUS USING SEMICONDUCTOR LIGHT EMITTING DEVICE, AND ELECTRONIC EQUIPMENT

SEMICONDUCTOR LIGHT EMITTING ELEMENT, SEMICONDUCTOR LIGHT EMITTING DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT, METHOD FOR MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE, ILLUMINATING APPARATUS USING SEMICONDUCTOR LIGHT EMITTING DEVICE, AND ELECTRONIC EQUIPMENT

机译:半导体发光元件,半导体发光元件,制造半导体发光元件的方法,制造半导体发光元件的方法,使用半导体发光元件的设备,半导体发光元件

摘要

PROBLEM TO BE SOLVED: To control peeling of a reflective layer and deterioration of reflection characteristics of a semiconductor light emitting element which is mounted with flip chip (FC).;SOLUTION: The semiconductor light emitting element is composed by laminating an n-type semiconductor layer, light emitting layer, and p-type semiconductor layer 160, and a first electrode 200 which is a cathode, formed on the p-type semiconductor layer 160 and is equipped with a first crystalline transparent electrode layer 210 and a second amorphous transparent electrode layer 220a between the p-type semiconductor layer 160 and a reflective layer 220b. The first crystalline transparent electrode layer 210 improves the adhesion with the p-type semiconductor layer 160, and the second amorphous transparent electrode layer 220a inhibits the peeling of the reflective layer 220b. Then the first transparent electrode layer 210 and the second transparent electrode layer 220a transmit light emitted from the light emitting layer and inhibit the deterioration of the reflection characteristics.;COPYRIGHT: (C)2011,JPO&INPIT
机译:解决的问题:为了控制反射层的剥离和安装有倒装芯片(FC)的半导体发光元件的反射特性的恶化。;解决方案:该半导体发光元件由n型半导体层压而成层,发光层和p型半导体层160,以及作为阴极的第一电极200,形成在p型半导体层160上,并配备有第一晶体透明电极层210和第二非晶透明电极在p型半导体层160和反射层220b之间的层220a。第一晶体透明电极层210改善了与p型半导体层160的粘合性,第二非晶透明电极层220a抑制了反射层220b的剥离。然后,第一透明电极层210和第二透明电极层220a透射从发光层发出的光,并抑制反射特性的劣化。; COPYRIGHT:(C)2011,JPO&INPIT

著录项

  • 公开/公告号JP2011061192A

    专利类型

  • 公开/公告日2011-03-24

    原文格式PDF

  • 申请/专利权人 SHOWA DENKO KK;

    申请/专利号JP20100180600

  • 申请日2010-08-11

  • 分类号H01L33/36;H01L33/32;

  • 国家 JP

  • 入库时间 2022-08-21 18:22:44

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号