Optical system and micro lithography exposure method of micro lithography projection exposure device

摘要

This invention, regards the optical system, and micro lithography exposure method of the micro lithography projection exposure device. Optical system of the micro lithography projection exposure device includes the image rotary vessel (50,50 '), that, in order the image rotary vessel (50,50 ') on the light which incidence is done at least partly the polarized light to be done is arranged in optical system, the image rotary vessel (50,50 '), just specified angle of rotation turns the both of intensity distribution and polarized light distribution the image rotary vessel (50,50 ') vis-a-vis the light which incidence is done on. Selective figure Figure 1