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Microfabrication of optical and electronic devices by soft lithography.

机译:通过软光刻对光学和电子设备进行微细加工。

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This thesis describes the fabrication of optical and electronic devices by soft lithography---a suite of techniques that uses low-cost materials and minimal infrastructure to pattern a wide range of materials. These methods facilitate the rapid prototyping of useful devices such as optical waveguides, electronic elements, and microfluidic channels. Contributions from both research and industrial laboratories, in terms of materials and techniques, have expanded the capabilities of soft lithography. Chapter 1 reviews the developments in soft lithographic techniques during 1999--2004.; The combination of microcontact printing (MCP) and wet-chemical etching is used commonly to pattern thin films of metals. Features patterned in palladium by this soft-lithographic technique have densities of defects much lower than features in the coinage metals (gold, silver, and copper) patterned by the same technique (Chapter 2 and Appendix VII); this characteristic improves reproducibility of operating properties of microelectronic devices. The origin of this improved resistance to etching is discussed in Appendix VIII. Chapter 2 also describes the fabrication of palladium-based wires and an H2 sensor by muCP.; Electrical microcontact printing (E-muCP) is a technique that uses a metal-coated PDMS stamp to pattern the flow of current through a substrate. Chapter 3 describes the use of this technique to pattern planar, optical waveguides in a thin film of phloxine B-doped poly(4-vinylphenol). This technique patterns large areas (>1 cm2) rapidly (90 s), and thus is useful for the rapid prototyping of optical splitters.; Most planar optical waveguides have limited tunability because the core and cladding materials are static in their composition and geometry. Chapter 4 introduces optical waveguides comprising a liquid core and a liquid cladding ("liq/liq waveguides") flowing in microfluidic channels made of PDMS. Liq/liq waveguides are dynamic in that their geometry and function depend on the continuous flow of the core and cladding fluids. The liquid/liquid interface is optically smooth because the liquids flow at low Reynolds numbers in microchannels; this property leads to low optical loss due to scattering at the interfaces. This system is useful for fabricating of tunable optical devices such as evanescent couplers, optical splitters, and optical filters (Chapter 5).
机译:本文介绍了通过软光刻技术制造光学和电子设备的方法,这是一套使用低成本材料和最少的基础设施来对各种材料进行图案化的技术。这些方法有助于快速制作有用设备的原型,例如光波导,电子元件和微流体通道。在材料和技术方面,研究实验室和工业实验室的贡献都扩大了软光刻的能力。第1章回顾了1999--2004年间软光刻技术的发展;微接触印刷(MCP)和湿化学蚀刻的组合通常用于图案化金属薄膜。通过这种软光刻技术在钯上构图的特征的缺陷密度远低于通过相同技术构图的造币金属(金,银和铜)的特征(第2章和附录VII);该特性改善了微电子器件的操作特性的可再现性。附录八讨论了这种提高的抗腐蚀能力。第2章还介绍了用muCP制造钯基导线和H2传感器。电气微接触印刷(E-muCP)是一种使用金属涂层的PDMS压模对通过基材的电流进行图案化的技术。第3章介绍了使用该技术在福禄知B掺杂的聚(4-乙烯基苯酚)薄膜中对平面的光波导进行构图的方法。这种技术可在90秒内迅速对大面积(> 1 cm2)进行图案化,因此对分光器的快速原型制造很有用。大多数平面光波导的可调谐性受到限制,因为纤芯和包层材料的成分和几何形状都是静态的。第4章介绍了光波导,该光波导包括在PDMS制成的微流体通道中流动的液体芯和液体包层(“ liq / liq波导”)。 Liq / liq波导是动态的,因为其几何形状和功能取决于纤芯和包层流体的连续流动。液/液界面在光学上是光滑的,因为液体在微通道中以低雷诺数流动。由于界面处的散射,该特性导致较低的光学损耗。该系统可用于制造可调光器件,例如e逝光耦合器,分光器和滤光片(第5章)。

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