首页> 外国专利> METHOD AND DEVICE FOR REMOVING PHOSPHORUS IMPURITY OR BORON IMPURITY FROM LIQUID POLYCHLOROSILANE AND AGENT FOR REMOVING PHOSPHORUS IMPURITY OR BORON IMPURITY FROM LIQUID POLYCHLOROSILANE

METHOD AND DEVICE FOR REMOVING PHOSPHORUS IMPURITY OR BORON IMPURITY FROM LIQUID POLYCHLOROSILANE AND AGENT FOR REMOVING PHOSPHORUS IMPURITY OR BORON IMPURITY FROM LIQUID POLYCHLOROSILANE

机译:从液态多氯硅烷除去磷杂质或硼杂质的方法和装置以及从液态多氯硅烷除去磷杂质或硼杂质的试剂

摘要

PROBLEM TO BE SOLVED: To provide a method and device for removing phosphorus impurities or boron impurities from crude liquid polychlorosilanes in a manufacturing process for obtaining a high-purity silicon crystal from metal class silicon, and to provide a removing agent.;SOLUTION: The removing method comprises contacting an activated carbon having an average grain size of 0.3-1.00 mm, having a volume of fine pores of ≤0.10 mL/g of a diameter of fine pores of 50-22,500 nm according to the method of mercury intrusion method, having a diameter of fine pores of 100-400 nm at the peak of the volume of fine pores in the diameter of fine pores of ≥50 nm, having a specific surface area measured by the BET method of ≥1,300 m2/g, having a filling density of ≥0.55 g/mL, having strongly heated residues of ≤0.5 mass%, having a dust incidence by water shake tests of ≤600 ppm (mass/mass), and a hardness of ≥99.5%, with the liquid polychlorosilanes.;COPYRIGHT: (C)2011,JPO&INPIT
机译:要解决的问题:提供一种在制造过程中从液态聚氯硅烷中去除磷杂质或硼杂质的方法和装置,以从金属类硅中获得高纯度硅晶体,并提供去除剂。去除方法包括根据汞压入法,使平均粒径为0.3-1.00mm,细孔体积为0.10mL / g,细孔直径为50-22,500nm的活性炭接触。 ,具有在≥50nm的微孔直径中的微孔体积的峰值处的微孔直径为100-400nm,具有通过BET方法测得的比表面积为& 1,300m 2 / g,填充密度为≥ 0.55 g / mL,强烈加热的残留物为≤ 0.5质量%,通过水振试验测得的粉尘进入率为≤ 600 ppm(质量/质量) ,使用液态聚氯硅烷的硬度为≥ 99.5%。; COPYRIGHT:(C)2011 ,JPO&INPIT

著录项

  • 公开/公告号JP2010269994A

    专利类型

  • 公开/公告日2010-12-02

    原文格式PDF

  • 申请/专利权人 KUREHA CORP;

    申请/专利号JP20100084836

  • 申请日2010-04-01

  • 分类号C01B33/107;C01B31/10;C01B31/14;

  • 国家 JP

  • 入库时间 2022-08-21 18:21:55

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