Pattern defect inspection method, pattern defect inspection test pattern substrate, pattern defect inspection apparatus, photomask manufacturing method, and display device substrate manufacturing method

摘要

A method for inspecting a pattern defect is provided to enable inspection within a short interval of time and improve productivity of a photomask by performing a macro inspection on a defect of a repetition pattern while using diffraction light. Unit patterns for a test are arranged in a test pattern(66) by a different period from that of a repetition pattern(56). The repetition pattern is polymerized to form a polymer pattern(70). Light is irradiated to the polymer pattern at a predetermined incidence angle. Diffraction light is monitored from the polymer pattern to inspect if defects exist in the repetition pattern. In forming the polymer pattern, the test pattern formed on one main surface of a transparent support body and the repetition pattern formed on one main surface of another transparent support body can be maintained to make the formation surfaces of the test pattern and the repetition pattern confront each other.