Split application manner and drawing manner of pattern for drawing, the split application device and the drawing device of pattern for drawing, being the pattern which it should draw on the record media null resist where the split application program

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for partitioning a pattern for writing which enable the partition of any pattern without generating a fine pattern, method for writing, mask and method for making the same, semiconductor device and method for manufacturing the same, program for partitioning a pattern for writing and computer readable recording medium recorded with the program. ;SOLUTION: Lines passing the peak of a pattern 21 to be written on a resist are set as first partition candidate lines L1a-L1d, and lines not passing the peak which are obtained based on the first partition candidate lines L1a-L1d are set as second partition candidate lines L2a-L2b, L2c-L2h. Out of regions demarcated by the first and second partition candidate lines, adjacent regions are combined into a rectangle or a trapezoid so as to eliminate short sides having a predetermined length or shorter, and the rectangle or the trapezoid obtained by this combination process is used as a writing unit of a writing apparatus 1.;COPYRIGHT: (C)2003,JPO