Improvement of the process model precision with the model of the mask angular section circular conversion effect

摘要

One execution form mask angular section circular conversion (MCR) offers the system and the technology which decide the improved process model which models the effect. While operating, the system may receive with the process data which is formed by applying photo lithography process to mask layout and mask layout. In addition as for the system, it is possible to contain the MCR component of set, it is possible to receive not yet calibration process model. Next, the system may identify the angular section of set in mask layout. Next, the system in order to obtain the mask layout which was corrected, may correct the mask layout which is approached to the angular section of set. Or, the system may decide the mask layer of set. Next, the system the mask layout which was corrected and/or using the mask layer of set, and the process data, may decide improved process model by calibrating not yet calibration process model.