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Method for inspecting and repairing the defects of the photoresist, as well as printed circuit board manufacturing process

机译:光刻胶缺陷的检修方法及印刷电路板的制造工艺

摘要

PROBLEM TO BE SOLVED: To provide a method of inspecting defects in photoresist and mending the photoresist to its original state.;SOLUTION: A substrate is provided with at least one film on its surface. A patterned photoresist layer is formed on the film. Then, optical inspection processing is carried out to check whether the patterned photoresist layer has defects. When the patterned resist layer has defects, the defects are classified into two groups, gaps and projections, and then the gaps and projections are positioned. If the patterned photoresist layer has defects, such as gaps etc, the patterned photoresist layer is subjected to for instance an ink jet printing method for filling up the gaps. If the patterned photoresist layer has defects, such as projections etc, the patterned photoresist layer undergoes for instance a laser method for removing the projections. Thus, defects in the patterned photoresist layer are removed, and the photoresist layer is mended to its original condition.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种检查光致抗蚀剂中的缺陷并将光致抗蚀剂修复至其原始状态的方法。解决方案:基板的表面至少具有一层膜。在膜上形成图案化的光刻胶层。然后,进行光学检查处理以检查图案化的光致抗蚀剂层是否具有缺陷。当图案化的抗蚀剂层具有缺陷时,将缺陷分为间隙和突起两类,然后定位间隙和突起。如果图案化的光致抗蚀剂层具有诸如间隙等的缺陷,则对图案化的光致抗蚀剂层进行例如喷墨印刷法以填充间隙。如果图案化的光致抗蚀剂层具有诸如凸起等的缺陷,则图案化的光致抗蚀剂层经历例如激光方法以去除凸起。因此,去除了图案化的光致抗蚀剂层中的缺陷,并且将光致抗蚀剂层修复到其原始状态。;版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP4583317B2

    专利类型

  • 公开/公告日2010-11-17

    原文格式PDF

  • 申请/专利权人 欣興電子股▲ふん▼有限公司;

    申请/专利号JP20060030300

  • 发明设计人 曽 子章;余 丞博;

    申请日2006-02-07

  • 分类号H05K3/00;G01N21/956;H05K3/28;

  • 国家 JP

  • 入库时间 2022-08-21 18:18:31

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