Production method pattern verification method, pattern verification system, the mask, a method of manufacturing a semiconductor device

摘要

PPROBLEM TO BE SOLVED: To improve the TAT (turn around time) of a verification process flow between a desired pattern and a mask pattern. PSOLUTION: The method includes steps of: preparing a desired pattern and a mask pattern corresponding to the desired pattern; setting one or more evaluation points at an edge of the desired pattern; calculating the light intensity at the evaluation point at a best focus time by using a calculation formula for light intensity; obtaining a prime differential value at the evaluation point in the calculation formula at the best focus time; calculating the light intensity at the evaluation point at a defocus time by using the calculation formula for light intensity; obtaining a prime differential value at the evaluation point in the calculation formula at the defocus time; obtaining a margin of exposure luminous energy from the prime differential values at the best focus time and the defocus time; and verifying the layout from the difference in the light intensity between the best focus time and the defocus time, the obtained margin of exposure luminous energy and preliminarily determined specifications. PCOPYRIGHT: (C)2009,JPO&INPIT