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Copper solution null for photochemical circuit formation manner and photochemical circuit formation
Copper solution null for photochemical circuit formation manner and photochemical circuit formation
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机译:用于光化学回路形成方式和光化学回路形成的铜溶液为零
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摘要
PROBLEM TO BE SOLVED: To directly form a wiring circuit on a substrate by continuously reductively depositing a metal (copper, etc.) by the irradiation with active energy rays.;SOLUTION: A method for forming a photochemical circuit with a reduction assistant that is carboxylic acid comprises: a step (a) of modifying an insulating substrate; a step (b) of depositing a mixed solution of metal ions with a reduction assistant on the insulating substrate; and a step (c) of forming a fine pattern of a metal by reductively depositing the metal ions onto the metal by the action of the reduction assistant accompanied with the irradiation with active energy rays. The carboxylic acid is decomposed by the irradiation with the active energy rays, and the metal ions are reduced by electrons emitted in that case to form a metal wiring circuit. Thus, there is no need for using a TiO2 photocatalyst as conventionally.;COPYRIGHT: (C)2007,JPO&INPIT
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