首页> 外国专利> Production manner of the integrated circuit, accumulation of the copper seed after doing, the injection manner which is done, the manner which forms the beer in formation manner, and the integrated circuit of barrier/seed surface formation.

Production manner of the integrated circuit, accumulation of the copper seed after doing, the injection manner which is done, the manner which forms the beer in formation manner, and the integrated circuit of barrier/seed surface formation.

机译:集成电路的生产方式,完成后铜籽的积累,完成的注入方式,形成啤酒的方式以及形成阻挡层/种子表面的集成电路。

摘要

Formation method of the integrated circuit, in the vicinity of thing and the barrier layer which form barrier layer alongside the side side wall and the base of the beer open part, has with the fact that at the same time fill layer is formed conformal in barrier layer and seed layer for the vicinity of thing and barrier layer and the seed layer which at the same time form seed layer conformal in barrier layer. The beer open part has the constitution which receives the beer material which connects with 1st conductive layer and 2nd conductive layer electrically.
机译:集成电路的形成方法,在与啤酒开口部的侧壁和底部并排形成阻挡层的物体和阻挡层附近,具有同时在阻挡层中保形地形成填充层的事实。物和阻挡层和种子层附近的层和种子层,它们同时形成在阻挡层中共形的种子层。啤酒开口部具有接收与第一导电层和第二导电层电连接的啤酒材料的结构。

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