Treating the non spatter field of PVD target structure, being the manner which treats the non spatter field of the PVD target structural null PVD target which includes the salient which parallels to

摘要

(For example, the side walls such as (14)) The present invention includes a PVD target having a non-sputter area, and a particulate trap forms are formed along the non-sputtered region. In a particular aspect, the particulate trap form, is capable of including a pattern of protrusions bent to form the receptacle, be provided with a microstructure on the protruding portion on a bent is possible. This target may also be a monolithic It is also possible to a portion of the target / backing plate structure. The invention also includes a method in which along the sidewalls of the sputtering target, or forming a particulate trap forms along the side wall of the target / backing plate structure. This form may be formed by forming a pattern of protrusions along the first side wall. This protrusion can be bent, to form a microstructure on the protrusion on crooked by exposing the particles thereafter.