The sintered body sputtering target and production method is suited for the production of the thin film which designates titanium oxide as the main component and the thin film which designates titanium oxide as the main component of the thin film which designates titanium oxide as the main component

摘要

It consists of the component of Ti, Ag and O, Ti above 29.6at% and below 34.0at%, Ag above 0.003at% and below 7.4at%, the remainder consists of oxygen, O/which is ratio of oxygen and the metal (2Ti+0.5Ag) the thin film which designates the titanium oxide which features that they are 0.97 or more as the main component. In high refractive index, it designates that the sintered body sputtering target and production method designates the titanium oxide which is suited for the production of the thin film and the same thin film which designate the titanium oxide which at the same time has low extinction coefficient as the main component as the main component of the thin film which designates titanium oxide as the main component are obtained as purpose. It is superior simultaneously in transmissivity, decrease of reflectance ratio is little, it makes the thing topic which obtains the thin film which is useful as an interference membrane or a protecting film of optical information record medium. In addition, application namely the heat wave reflected membrane and the antireflection film to the glass baseplate, as the interference filter it makes possible that you use.