首页> 外国专利> METHODS OF FABRICATING VERTICAL CARBON NANOTUBE FIELD EFFECT TRANSISTORS FOR ARRANGEMENT IN ARRAYS AND FIELD EFFECT TRANSISTORS AND ARRAYS FORMED THEREBY

METHODS OF FABRICATING VERTICAL CARBON NANOTUBE FIELD EFFECT TRANSISTORS FOR ARRANGEMENT IN ARRAYS AND FIELD EFFECT TRANSISTORS AND ARRAYS FORMED THEREBY

机译:制造阵列中垂直碳纳米管场效应晶体管的方法以及由此形成的场效应晶体管和阵列

摘要

A method for forming carbon nanotube field effect transistors, arrays of carbon nanotube field effect transistors, and device structures and arrays of device structures formed by the methods. The methods include forming a stacked structure including a gate electrode layer and catalyst pads each coupled electrically with a source/drain contact. The gate electrode layer is divided into multiple gate electrodes and at least one semiconducting carbon nanotube is synthesized by a chemical vapor deposition process on each of the catalyst pads. The completed device structure includes a gate electrode with a sidewall covered by a gate dielectric and at least one semi­conducting carbon nanotube adjacent to the sidewall of the gate electrode. Source/drain contacts are electrically coupled with opposite ends of the semiconducting carbon nanotube to complete the device structure. Multiple device structures may be configured either as a memory circuit or as a logic circuit.
机译:一种形成碳纳米管场效应晶体管的方法,碳纳米管场效应晶体管的阵列,以及由该方法形成的器件结构和器件结构的阵列。该方法包括形成堆叠结构,该堆叠结构包括分别与源极/漏极触点电耦合的栅电极层和催化剂垫。栅电极层被分成多个栅电极,并且通过化学气相沉积工艺在每个催化剂垫上合成至少一个半导体碳纳米管。完整的器件结构包括:栅电极,其侧壁被栅电介质覆盖;以及至少一个与栅电极的侧壁相邻的半导体碳纳米管。源极/漏极触点与半导体碳纳米管的相对端电耦合以完成器件结构。多个器件结构可以被配置为存储电路或逻辑电路。

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