首页> 外国专利> METHOD FOR MEASURING OPTICAL ABERRATIONS WITH VARIABLE RANGE AND SENSITIVITY USING TWO RECONFIGURABLE OPTICAL ELEMENTS, AND DEVICE FOR PERFORMING SAME

METHOD FOR MEASURING OPTICAL ABERRATIONS WITH VARIABLE RANGE AND SENSITIVITY USING TWO RECONFIGURABLE OPTICAL ELEMENTS, AND DEVICE FOR PERFORMING SAME

机译:使用两个可重构光学元件测量具有可变范围和灵敏度的光学像差的方法以及执行相同方法的设备

摘要

The invention relates to a method for measuring optical aberrations with variable range and sensitivity using two reconfigurable optical elements and to a device for performing same. The wavefront (A) to be analysed hits a sampling sub-system (1) that includes a reconfigurable optical element (11) which provides an irradiance pattern (P) that has a controllable position and shape and can be used to measure the aberration. According to the invention, a sub-system (2), which contains another reconfigurable optical element (21), forms an image (I) of the pattern (P) on a fixed plane (3). A detector (4) is disposed on said plane and connected to an analysis sub-system (5) which calculates the aberration (F) of the front (A). A sub-system (6) controls the properties of the reconfigurable elements (11 and 21). Consequently, it is not necessary for the detector to be moved mechanically in order to place same in the variable position in which the pattern (P) is formed.
机译:本发明涉及一种使用两个可重新配置的光学元件来测量具有可变范围和灵敏度的光学像差的方法以及一种用于执行该方法的装置。待分析的波前(A)撞击采样子系统(1),该采样子系统包括可重构光学元件(11),该光学元件提供具有可控制的位置和形状的辐照度图案(P),并可用于测量像差。根据本发明,包含另一个可重构光学元件(21)的子系统(2)在固定平面(3)上形成图案(P)的图像(I)。检测器(4)布置在所述平面上并且连接至分析子系统(5),该分析子系统计算正面(A)的像差(F)。子系统(6)控制可重配置元素(11和21)的属性。因此,不需要为了使检测器放置在形成图案(P)的可变位置而机械地移动检测器。

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