首页> 外国专利> CORRECTING METHOD OF THE PYROMETER COMPRISING THE CALIBRATION PROCESS OF THE COST - EFFICIENCY, AND THE SYSTEM FOR THE TEMPERATURE DETERMINATION OF THE METHOD FOR DETERMINING THE TEMPERATURE OF THE SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER

CORRECTING METHOD OF THE PYROMETER COMPRISING THE CALIBRATION PROCESS OF THE COST - EFFICIENCY, AND THE SYSTEM FOR THE TEMPERATURE DETERMINATION OF THE METHOD FOR DETERMINING THE TEMPERATURE OF THE SEMICONDUCTOR WAFER AND SEMICONDUCTOR WAFER

机译:包括成本效率校准过程的热释光体的校正方法,以及用于确定半导体晶片和晶片晶片温度的方法的温度确定系统

摘要

PURPOSE: The method for correcting the pyrometer in which the correcting method of pyrometer, and the system for the temperature determination of the method for determining the temperature of the semiconductor wafer and semiconductor wafer get over the disadvantage of the prior art is offered.;CONSTITUTION: One or more thermal radiation signal measured at corrects the pyrometer(1) which is adjusted in order to intercept the thermal radiation allocated to the temperature value and it measures. The calibration sample(12) is composed of the semiconductor wafer(2) and the transparency correction layer(13) arranged on the semiconductor wafer.;COPYRIGHT KIPO 2011
机译:目的:提供一种高温计的校正方法,其中提供一种高温计的校正方法,以及一种用于确定半导体晶片和半导体晶片的温度的方法的温度确定系统,以克服现有技术的缺点。 :在处测量的一个或多个热辐射信号会校正高温计(1),调节该高温计以拦截分配给温度值的热辐射并进行测量。校准样品(12)由半导体晶片(2)和布置在半导体晶片上的透明度校正层(13)组成。; COPYRIGHT KIPO 2011

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