CHEMICAL SUPPLYING APPARATUS TO UNIFORMLY SUPPLY CHEMICAL FOR CLEANING A SUBSTRATE

摘要

PURPOSE: A chemical supplying apparatus is provided to form uniform supply pressure by preventing a pressure loss due to bubbles.;CONSTITUTION: A supply line(110) flows the chemical for processing a substrate. At least one supply tank is connected to a supply line and stores the chemical. A bubble removing unit(130) is installed on a supply line. The bubble removing unit is installed on the supply line and removes the bubble inside the chemical.;COPYRIGHT KIPO 2011