EXTREME ULTRAVIOLET RAY MASK, CAPABLE OF SUPPRESSING A PATTERN SHIFT PHENOMENON IN AN EXTREME ULTRAVIOLET RAY LITHOGRAPHY PROCESS

摘要

PURPOSE: An extreme ultraviolet ray mask is provided to transfer fine patterns without the deformation of the patterns by preventing the generation of a pattern shift phenomenon due to a stepped part.;CONSTITUTION: A reflecting plate(20) is arranged on both the right side and the left side of a supporting board. The reflecting plate is composed of a first reflecting plate(21) and a second reflecting plate(23). A tilt driving part is in connection with the rear side of the reflecting plate. A tilt controlling part controls the operation of the tilt driving part. The tilt driving part tilts the slope of the first reflecting plate in order to form a mask layout(60).;COPYRIGHT KIPO 2011