PHOTORESIST PATTERNS FORMATION METHOD, CAPABLE OF PREVENTING COLLAPSE OF PHOTORESIST PATTERS

摘要

PURPOSE: A photoresist patterns formation method is provided to reduce the surface tension by the cleaning solution by surface processing the surface of the photoresist pattern using organic solution before implementing the cleaning process.;CONSTITUTION: A photoresist film is formed on the top of the semiconductor substrate. A photoresist film is patterned by patterning the photoresist layer with the exposure and development processes(S11-S13). The surface of the photoresist pattern uses the organic solvent for surface-process(S15).;COPYRIGHT KIPO 2011